Cookies help us deliver our services. By using our services, you agree to our use of cookies. More information

Talk:MiPNet19.03 O2k-cleaning and ISS

From Bioblast
Revision as of 15:29, 20 August 2014 by Fasching Mario (talk | contribs) (Created page with "== == Question: Colleagues and I want to introduce heavy metals into the chambers of the oxygraph-2k. We were wondering what that would mean in terms of ...")
(diff) ← Older revision | Latest revision (diff) | Newer revision β†’ (diff)

Question: Colleagues and I want to introduce heavy metals into the chambers of the oxygraph-2k. We were wondering what that would mean in terms of cleaning: Would acid-washing the chambers with either 0,1-0,3N HNO3 or HCl be a problem for the membranes?

Answer: 1.) The glass chambers and membranes would not be a problem, but the blue plastic part (the chamber holder) might be. If you are not in a hurry, we can test this (not today, sometime during the week). If you want to be on the safe side, then disassemble the chamber and clean the glass chambers separately.

2.) we tested approx 0.3 M HNO3 over night at room temperature plus 2 hours at approx 35 Β°C on the following materials: PVDF (POS membranes, stoppers), POM O2k-Chamber Holder), butyl rubber ( OroboPOS-Seal Tip, and Viton O-ring\Viton\12x1 mm.